1μm Metal Filter Media For Semi-conductor Process Gas Purification ---Wafer Manufacture With AMC Control

Product type: Ultrafine 316L stainless steel short fiber

Fiber Diameter: 1um/1.5um/2um available

Cut Length: 80-100um

Chemical Composition of Raw material( Wt% )

In semiconductor manufacturing, maintaining ultra-high purity process gases is critical to prevent defects and ensure high yields. 1μm metal filter media play a vital role in gas purification by removing particulate contaminants while also contributing to Airborne Molecular Contamination (AMC) control, which is essential for advanced wafer fabrication.

Key Features & Benefits

High-Efficiency Filtration (1μm Retention)

Captures sub-micron particles that could cause defects in photolithography, etching, and deposition processes.

Reduces risk of wafer surface contamination, improving yield.

Chemically Inert & Corrosion-Resistant

Made from high-purity stainless steel (316L), nickel, or sintered alloys for compatibility with aggressive gases (e.g., HF, HCl, NH₃).

Resists outgassing, preventing additional contamination.

AMC Control Capability

Some advanced metal filters incorporate surface treatments or coatings (e.g., passivation, electropolishing) to minimize adsorption/desorption of volatile organics or acids.

Helps meet SEMI F21 AMC Class 1 requirements for sensitive processes like EUV lithography.

High Temperature & Pressure Resistance

Stable performance in harsh conditions (up to 500°C or higher for some alloys).

Suitable for CVD, diffusion, and ion implantation gas lines.

Long Service Life & Cleanability

Reusable after cleaning (ultrasonic, chemical, or thermal methods), reducing cost of ownership.

Low pressure drop design for energy-efficient gas flow.

Applications in Semiconductor Manufacturing

Ultra-high purity (UHP) gas delivery (N₂, Ar, H₂, O₂, etc.)

Etch & deposition processes (CVD, PVD, ALD)

Photolithography (AMC-sensitive EUV/DUV environments)

Bulk gas & point-of-use (PoU) filtration

Why Metal Filters Over Alternatives?

Superior durability vs. polymeric filters (which can degrade and shed particles).

No fiber shedding unlike traditional HEPA/ULPA filters.

Better AMC mitigation compared to standard particulate filters.

Compliance & Standards

SEMI F20 (Particulate Control)

SEMI F21 (AMC Classification)

ISO 14644-1 (Cleanroom Standards)

Conclusion

1μm metal filter media is a robust solution for semiconductor gas purification, combining particulate filtration, AMC control, and chemical resistance to meet the stringent demands of advanced wafer fabrication.